Chemical analysis of particles and semiconductor microstructures by synchrotron radiation soft X-rays photoemission spectromicroscopy

Autor:	A. Johnsono, Peter Coon, C. Ayre, Yuri Uritsky, W.F. Steele, F. Gozzo, H. Fujimoto, Howard A. Padmore, T. Renner, G.D. Ackermann, B. Sheridan, R. Ynzunza, P. D. Kinney, Zahid Hussain, Baylor B. Triplett
Předmět:	Microscope Materials science Silicon business.industry Analytical chemistry chemistry.chemical_element Synchrotron radiation Particle accelerator Synchrotron law.invention Chemical state chemistry X-ray photoelectron spectroscopy law Optoelectronics Wafer business
Zdroj:	Scopus-Elsevier
Popis:	Chemical analysis on a microscopic scale was performed on a TiN particle sample on silicon and on two patterned samples using a synchrotron source scanning photoemission microscope. For all the experiments, we exploit the ability, developed in our experimental system, to reach specific locations on the wafer and analyze the local chemical state.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::02f99fd601cbe904d50c17199622b0bb http://www.scopus.com/inward/record.url?eid=2-s2.0-0031627926&partnerID=MN8TOARS Zobrazit plný text záznamu