Ultra-clean high-mobility graphene on technologically relevant substrates
| Autor: | Ayush Tyagi, Vaidotas Mišeikis, Leonardo Martini, Stiven Forti, Neeraj Mishra, Zewdu M. Gebeyehu, Marco A. Giambra, Jihene Zribi, Mathieu Frégnaux, Damien Aureau, Marco Romagnoli, Fabio Beltram, Camilla Coletti |
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| Přispěvatelé: | National Enterprise for nanoScience and nanoTechnology (NEST), Scuola Normale Superiore di Pisa (SNS)-Scuola Universitaria Superiore Sant'Anna [Pisa] (SSSUP)-Istituto Italiano di Tecnologia (IIT)-Consiglio Nazionale delle Ricerche [Pisa] (CNR PISA), IIT Graphene Labs, Istituto Italiano di Tecnologia (IIT), CamGraPhIC srl, Institut Lavoisier de Versailles (ILV), Université de Versailles Saint-Quentin-en-Yvelines (UVSQ)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Consiglio Nazionale delle Ricerche Area della Ricerca di Pisa (CNIT), We acknowledge financial support from Fondazione Tronchetti Provera and National Centre for Scientific Research in the framework of the Emergence program at INC-CNRS. The research leading these results has received funding from the European Union Horizon 2020 Programme under grant agreement no. 881603 Graphene Core 3., European Project: 881603,H2020,H2020-SGA-FET-GRAPHENE-2019, GrapheneCore3(2020) |
| Jazyk: | angličtina |
| Rok vydání: | 2022 |
| Předmět: | |
| Zdroj: | Nanoscale Nanoscale, In press, ⟨10.1039/d1nr05904a⟩ |
| ISSN: | 2040-3364 2040-3372 |
| DOI: | 10.1039/d1nr05904a⟩ |
| Popis: | Graphene grown via chemical vapour deposition (CVD) on copper foil has emerged as a high-quality, scalable material, that can be easily integrated on technologically relevant platforms to develop promising applications in the fields of optoelectronics and photonics. Most of these applications require low-contaminated high-mobility graphene (i.e., approaching 10 000 $cm^2 V^{-1} s^{-1}$) at room temperature) to reduce device losses and implement compact device design. To date, these mobility values are only obtained when suspending or encapsulating graphene. Here, we demonstrate a rapid, facile, and scalable cleaning process, that yields high-mobility graphene directly on the most common technologically relevant substrate: silicon dioxide on silicon (SiO$_2$/Si). Atomic force microscopy (AFM) and spatially-resolved X-ray photoelectron spectroscopy (XPS) demonstrate that this approach is instrumental to rapidly eliminate most of the polymeric residues which remain on graphene after transfer and fabrication and that have adverse effects on its electrical properties. Raman measurements show a significant reduction of graphene doping and strain. Transport measurements of 50 Hall bars (HBs) yield hole mobility ${\mu}_h$ up to 9000 $cm^2 V^{-1} s^{-1}$ and electron mobility ${\mu}_e$ up to 8000 $cm^2 V^{-1} s^{-1}$, with average values ${\mu}_h$ 7500 $cm^2 V^{-1} s^{-1}$ and ${\mu}_e$ 6300 $cm^2 V^{-1} s^{-1}$. The carrier mobility of ultraclean graphene reach values nearly double of that measured in graphene HBs processed with acetone cleaning, which is the method widely adopted in the field. Notably, these mobility values are obtained over large-scale and without encapsulation, thus paving the way to the adoption of graphene in optoelectronics and photonics. Comment: 20 pages, 11 figures |
| Databáze: | OpenAIRE |
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