High Efficiency Echelle Gratings for the Far Ultraviolet

Autor:	Nicholas Kruczek, Drew M. Miles, Brian Fleming, Randall McEntaffer, Kevin France, Fabien Grisé, Stephan McCandliss
Jazyk:	angličtina
Rok vydání:	2022
Předmět:	FOS: Physical sciences Electrical and Electronic Engineering Astrophysics - Instrumentation and Methods for Astrophysics Engineering (miscellaneous) Instrumentation and Methods for Astrophysics (astro-ph.IM) Atomic and Molecular Physics and Optics
Popis:	Modern grating manufacturing techniques suffer from inherent issues that limit their peak efficiencies. The anisotropic etching of silicon facilitates the creation of custom gratings that have sharp and atomically smooth facets, directly addressing these issues. We describe work to fabricate and characterize etched silicon echelles optimized for the far ultraviolet (FUV; 90 - 180 nm) bandpass. We fabricate two echelles that have similar parameters to the mechanically ruled grating flown on the CHESS sounding rocket. We demonstrate a 42% increase in peak order efficiency and an 83% decrease in interorder scatter using these gratings. We also present analysis on where the remaining efficiency resides. These demonstrated FUV echelle improvements benefit the faint source sensitivity and high-resolution performance of future UV observatories. 21 pages, 13 figures, Accepted into Applied Optics
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0256913484af919c8e6bce06ed54fc91 http://arxiv.org/abs/2207.07659 Zobrazit plný text záznamu