Potential sensitivities in frequency modulation and heterodyne amplitude modulation Kelvin probe force microscopes
| Autor: | Hui Xue, Jun Liu, Zong-Min Ma, Jun Tang, Ji-Liang Mu, Huan Zhang, Yan Jun Li, Chenyang Xue |
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| Rok vydání: | 2013 |
| Předmět: |
Kelvin probe force microscope
Heterodyne Materials science Microscope business.industry Resolution (electron density) Analytical chemistry Nano Commentary Kelvin probe force microscopy Condensed Matter Physics law.invention Amplitude modulation Optics Materials Science(all) law Microscopy Frequency modulation Heterodyne amplitude modulation General Materials Science business Volta potential |
| Zdroj: | Nanoscale Research Letters |
| ISSN: | 1556-276X |
| DOI: | 10.1186/1556-276x-8-532 |
| Popis: | In this paper, the potential sensitivity in Kelvin probe force microscopy (KPFM) was investigated in frequency modulation (FM) and heterodyne amplitude modulation (AM) modes. We showed theoretically that the minimum detectable contact potential difference (CPD) in FM-KPFM is higher than in heterodyne AM-KPFM. We experimentally confirmed that the signal-to-noise ratio in FM-KPFM is lower than that in heterodyne AM-KPFM, which is due to the higher minimum detectable CPD dependence in FM-KPFM. We also compared the corrugations in the local contact potential difference on the surface of Ge (001), which shows atomic resolution in heterodyne AM-KPFM. In contrast, atomic resolution cannot be obtained in FM-KPFM under the same experimental conditions. The higher potential resolution in heterodyne AM-KPFM was attributed to the lower crosstalk and higher potential sensitivity between topographic and potential measurements. |
| Databáze: | OpenAIRE |
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