Stable Al 2 O 3 Encapsulation of MoS 2 ‐FETs Enabled by CVD Grown h‐BN

Autor: Agata Piacentini, Damiano Marian, Daniel S. Schneider, Enrique González Marín, Zhenyu Wang, Martin Otto, Bárbara Canto, Aleksandra Radenovic, Andras Kis, Gianluca Fiori, Max C. Lemme, Daniel Neumaier
Jazyk: angličtina
Předmět:
Zdroj: Advanced electronic materials 8(9), 2200123 (2022). doi:10.1002/aelm.202200123
Advanced Electronic Materials
ISSN: 2199-160X
DOI: 10.1002/aelm.202200123
Popis: Advanced electronic materials 2200123 (2022). doi:10.1002/aelm.202200123
Published by Wiley-VCH Verlag GmbH & Co. KG, Weinheim
Databáze: OpenAIRE