High PAE high reliability AlN/GaN double heterostructure

Autor: Malek Zegaoui, Farid Medjdoub, Astrid Linge, Riccardo Silvestri, Gaudenzio Meneghesso, B. Grimbert, Enrico Zanoni, Matteo Meneghini
Přispěvatelé: Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF), Università degli Studi di Padova = University of Padua (Unipd)
Jazyk: angličtina
Rok vydání: 2015
Předmět:
Zdroj: Solid-State Electronics
Solid-State Electronics, 2015, 113, pp.49-53. ⟨10.1016/j.sse.2015.05.009⟩
Solid-State Electronics, Elsevier, 2015, 113, pp.49-53. ⟨10.1016/j.sse.2015.05.009⟩
ISSN: 0038-1101
Popis: International audience; We report on AlN/GaN double heterostructures for high frequency applications. 600 h preliminary reliability assessment has been performed on these emerging RF devices, showing promising millimeter-wave 100 nm gate length GaN-on-Si device stability for the first time. A 150 nm AlN/GaN double heterostructure has been developed and evaluated on SiC substrate. State-of-the-art CW power-added-efficiencies (PAE) up to 40 GHz have been achieved on ultrathin barrier (6 nm) GaN devices while operating at a drain bias exceeding 30 V.
Databáze: OpenAIRE