High-aspect-ratio nanoimprint process chains
| Autor: | Victor J. Cadarso, Helmut Schift, Nachiappan Chidambaram, Loïc Jacot-Descombes |
|---|---|
| Rok vydání: | 2017 |
| Předmět: |
Materials science
Fabrication Materials Science (miscellaneous) Nanophotonics Nanotechnology 02 engineering and technology Molding (process) 01 natural sciences Industrial and Manufacturing Engineering Nanoimprint lithography law.invention law 0103 physical sciences Electrical and Electronic Engineering 010302 applied physics Thin layers business.industry 021001 nanoscience & nanotechnology Condensed Matter Physics Aspect ratio (image) Atomic and Molecular Physics and Optics Resist Proof of concept Optoelectronics 0210 nano-technology business |
| Zdroj: | Microsystems & Nanoengineering. 3 |
| ISSN: | 2055-7434 |
| DOI: | 10.1038/micronano.2017.17 |
| Popis: | Different methods capable of developing complex structures and building elements with high-aspect-ratio nanostructures combined with microstructures, which are of interest in nanophotonics, are presented. As originals for subsequent replication steps, two families of masters were developed: (i) 3.2 μm deep, 180 nm wide trenches were fabricated by silicon cryo-etching and (ii) 9.8 μm high, 350 nm wide ridges were fabricated using 2-photon polymerization direct laser writing. Both emerging technologies enable the vertical smooth sidewalls needed for a successful imprint into thin layers of polymers with aspect ratios exceeding 15. Nanoridges with high aspect ratios of up to 28 and no residual layer were produced in Ormocers using the micromoulding into capillaries (MIMIC) process with subsequent ultraviolet-curing. This work presents and balances the different fabrication routes and the subsequent generation of working tools from masters with inverted tones and the combination of hard and soft materials. This provides these techniques with a proof of concept for their compatibility with high volume manufacturing of complex micro- and nanostructures. New methods pave the way for the high-volume manufacture of complex micro- and nanostructures with a high aspect ratio (HAR). HAR microstructures have uses in a variety of applications, including gas chromatography and X-ray optics, but making such structures with height-to-width ratios of 10 or more is particularly challenging. To address this, Helmut Schift and his colleagues from the Paul Scherrer Institute, Switzerland, in partnership with German company micro resist technology, used two emerging technologies for manufacturing HAR microstructures to help fabricate nanoridge structures with aspect ratios of up to 28. The team’s work provides molding tools for fabricating HAR microstructures that combine hard and soft materials, and confirms that the emerging technologies are compatible with the replication of complex micro- and nanostructures, holding promise for the development of innovative nanophotonics applications. |
| Databáze: | OpenAIRE |
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