Synthesis and photocatalytic performance of Bi2O3 thin films obtained in a homemade spin coater
| Autor: | Gabriel N. Rodrigues, Wlademir R. de Oliveira, Vagner R. de Mendonça, Fernando C. Soares, Paulo H. E. Falsetti, Douglas M. S. Del Duque, Bruno Fernando Gianelli |
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| Rok vydání: | 2021 |
| Předmět: |
Spin coating
Materials science 02 engineering and technology Substrate (electronics) 010402 general chemistry 021001 nanoscience & nanotechnology 01 natural sciences 0104 chemical sciences law.invention chemistry.chemical_compound Sessile drop technique chemistry Chemical engineering Mechanics of Materials law Materials Chemistry Rhodamine B Photocatalysis General Materials Science Thin film Crystallization 0210 nano-technology Photodegradation |
| Zdroj: | Materials Today Communications. 27:102214 |
| ISSN: | 2352-4928 |
| DOI: | 10.1016/j.mtcomm.2021.102214 |
| Popis: | This paper describes the deposition of Bi2O3 thin films by spin-coating in a homemade apparatus and their application as photocatalyst in dye photodegradation under UV radiation. For substrate fixation in the spin coating equipment, we developed an alternative method named fit-in method, where the substrate is directlly fixed in a polytetrafluorethylene (PTFE) polymer base used as a sample holder. The Bi2O3 precursor resin was obtained according to the polymeric precursor method and deposited on glass substrates by a dynamic system operating at 4000 RPM, varying the number of added drops (10 or 20), followed by a calcination step to promote oxide crystallization. The thin films were characterized by X-ray diffratometry (XRD), scanning electronic microscopy (SEM), energy dispersive X-ray spectroscopy (EDX), atomic force microscopy (AFM), and sessile drop method (SDM). The photocatalytic efficiency of Bi2O3 thin films was evaluated by the photodegradation of Rhodamine B (RhB) under UV radiation. The as-obtained Bi2O3 thin films presented high performance in RhB dye removal from aqueous solution and stability during five cycles of reuse, regardless of deposition conditions, which is considered the main feature of a thin film used as a photocatalyst. |
| Databáze: | OpenAIRE |
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