Electron beam lithography, a helpful tool for nanooptics
| Autor: | Joachim R. Krenn, Harald Ditlbacher, Alfred Leitner, Bernhard Lamprecht, Andreas Hohenau, Franz R. Aussenegg |
|---|---|
| Rok vydání: | 2006 |
| Předmět: |
Fabrication
Materials science business.industry Nanotechnology Condensed Matter Physics Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials Computer data storage Spectral coding Microelectronics Metal nanostructures Electrical and Electronic Engineering business Lithography Plasmon Electron-beam lithography |
| Zdroj: | Microelectronic Engineering. 83:1464-1467 |
| ISSN: | 0167-9317 |
| Popis: | Nanooptics, in particular optics with nanometric metal structures is currently a fast developing field of science, motivated by the prospects of good integrateability to microelectronics. In the following, we give a short introduction to the field of nanooptics and its link to microelectronics and we discuss the importance of e-beam lithography for the fabrication of nanooptical elements. Two examples of a possible advantageous application of nanooptical elements are given: Spectrally coded data storage and light guiding by sub-micron metal structures. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|
Full Text from ScienceDirect