Plasma Uniformity Analysis of Inductively Coupled Plasma Assisted Magnetron Sputtering by a 2D Voltage Probe Array
| Autor: | Junghoon Joo |
|---|---|
| Rok vydání: | 2014 |
| Předmět: |
Chemistry
business.industry Materials Science (miscellaneous) Analytical chemistry General Medicine Plasma Sputter deposition Condensed Matter Physics Voltmeter Sputtering Inductively coupled plasma atomic emission spectroscopy Cavity magnetron Optoelectronics Electrical and Electronic Engineering Physical and Theoretical Chemistry Inductively coupled plasma business Voltage |
| Zdroj: | Applied Science and Convergence Technology. 23:161-168 |
| ISSN: | 2288-6559 |
| Popis: | A real?time monitoring of immersed antenna type inductively coupled plasma (ICP) was done with a homemade 2 dimensional voltage probe array to check the uniformity of the plasma. Measured voltage values with a high impedance voltmeter are close to the floating potential of the plasma. As the substrate carrier was moving into a magnetron sputtering plasma diffusive from a 125 mm×625 mm size cathode, measured results showed reliably separation of plasma into the upper and lower empty space over the carrier. Infra red thermal imaging camera was used to observe the cross corner effect in situ without eroding a target to the end of the usage. 3 dimensional particle trace model was used to analyze the magnetron discharge"s behavior. |
| Databáze: | OpenAIRE |
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