Resonance enhancement of the photoemission from semiconductors with negative electron affinity
Autor: | L. G. Gerchikov, A. V. Subashiev |
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Rok vydání: | 1996 |
Předmět: | |
Zdroj: | Journal of Applied Physics. 80:6008-6012 |
ISSN: | 1089-7550 0021-8979 |
Popis: | The variation of photoemission from negative electron affinity semiconductor surface with the position of the surface Fermi level is theoretically studied. Resonance maxima both in photoyield and surface recombination rate (when the depth and the width of the quantum well in the band bending region (BBR) are close to the appearance of new quantum level) are predicted as a result of quantum character of the electron motion in the BBR. The resonance BBR transmission is expected to manifest itself in the temperature, doping, and thickness of the activation layer photoyield dependence. Experimental studies of the dependencies should help to monitor the evolution of the BBR during surface activation to the negative electron affinity state. |
Databáze: | OpenAIRE |
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