Autor: | A. E. Ivanchikov, V. E. Borisenko, V. I. Pachynin, A. M. Kisel, V. I. Plebanovich |
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Rok vydání: | 2003 |
Předmět: |
Thermal oxidation
Materials science fungi technology industry and agriculture Oxide macromolecular substances Condensed Matter Physics Electronic Optical and Magnetic Materials chemistry.chemical_compound stomatognathic system chemistry Chemical engineering Etching (microfabrication) Materials Chemistry LOCOS Electrical and Electronic Engineering |
Zdroj: | Russian Microelectronics. 32:145-150 |
ISSN: | 1063-7397 |
Popis: | The formation mechanism, composition, and properties of an oxide film that grows on an Si3N4 mask during the LOCOS process are studied experimentally. The effect of the HF etching of the mask oxide film on the profile of the bird's beak is investigated for different etching conditions. |
Databáze: | OpenAIRE |
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