| Popis: |
In recent years there has been an increasing need of ultra precision positioning and scanning systems with nanometer, or even subnanometer, resolution and accuracy. To meet the demand requires the development of new design concepts and techniques. A newly developed x-y stage is introduced in the paper. The stage was mainly designed for applications in SPMs, with subnanometer resolution and equivalent repeatability over a 50 by 50 micrometers scanning range. The yaw, roll and pitch errors of the stage are 2 arcsec., 0.8 arcsec., and 0.8 arcsec., respectively for the whole range. Some design considerations, such as stiffness, settling time and distortion of the frame are discussed. The experimental results are presented and its application in SPM demonstrated.© (1996) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only. |
