Stress anisotropy and stress gradient in magnetron sputtered films with different deposition geometries
| Autor: | Z. B. Zhao, Steven M. Yalisove, J. C. Bilello |
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| Rok vydání: | 2006 |
| Předmět: | |
| Zdroj: | Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 24:195-201 |
| ISSN: | 1520-8559 0734-2101 |
| DOI: | 10.1116/1.2150230 |
| Popis: | Mo films were deposited via magnetron sputtering with two different deposition geometries: dynamic deposition (moving substrate) and static deposition (fixed substrate). The residual stress and structural morphologies of these films were investigated, with particular focus on in-plane anisotropy of the biaxial stress and stress gradient across the film thickness. The results revealed that the Mo films developed distinct states of residual stress, which depended on both deposition geometry and film thickness. With the dynamic geometry, the Mo films generally exhibited anisotropic stress. Both the degree of anisotropy and the magnitude of stress varied as functions of film thickness. The variation of stress was linked to the evolution of anisotropic microstructures in the films. The Mo films from the static geometry developed isotropic residual stress, which was more compressive and noticeably larger in magnitude than that of the Mo films from the dynamic geometry. Aside from these disparities, the two type... |
| Databáze: | OpenAIRE |
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