Resist pattern resolution on hard mask layer for photomask
Autor: | Naoto Yonemaru, Kazuaki Matsui, Itaru Yoshida, Yosuke Kojima, Mitsuharu Yamana |
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Rok vydání: | 2022 |
Zdroj: | Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology. |
Databáze: | OpenAIRE |
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