Resist pattern resolution on hard mask layer for photomask

Autor:	Naoto Yonemaru, Kazuaki Matsui, Itaru Yoshida, Yosuke Kojima, Mitsuharu Yamana
Rok vydání:	2022
Zdroj:	Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::fe435268bd2ac866e3882ea83d327c82 https://doi.org/10.1117/12.2640377 Zobrazit plný text záznamu