Physical and Electro-Optical Properties of Ion Beam Sputtered Thin Film PLZT Ceramic
Autor: | L.L. Boyer, J.R. Mcneil, A. Y. Wu |
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Rok vydání: | 1990 |
Předmět: | |
Zdroj: | MRS Proceedings. 200 |
ISSN: | 1946-4274 0272-9172 |
DOI: | 10.1557/proc-200-97 |
Popis: | High quality PLZT thin films have been deposited using ion beam sputtering. The deposited material has perovskite crystal structure tetragonal in phase with the c-axis predominantly normal to the surface. Material deposited at temperatures below 450°C has pyrochlore structure while that deposited above 650°C displays polycrystalline characteristics. The deposition rate was approximately 0.2–0.5 Å/sec yielding film thicknesses of ∼4500 Å. The surface morphology of the deposited films is of high quality with a RMS roughness 60% that of magnetron sputtered films. |
Databáze: | OpenAIRE |
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