CD metrology by an immersion microscope with high NA condenser lens for 45-nm generation masks

Autor: Takashi Hirano, Rikiya Taniguchi, Takeshi Yamane
Rok vydání: 2007
Předmět:
Zdroj: SPIE Proceedings.
ISSN: 0277-786X
Popis: An immersion microscope with high NA condenser lens is evaluated. The effects of high NA condenser lens are studied with simulation and experiment. The one effect is CD linearity improvement. We have already reported that our calibration method improves CD linearity of an immersion microscope. The simulation result indicates the high NA condenser lens improves the accuracy of the calibration method. The other effect is CD repeatability. The experimental result demonstrates the high NA condenser lens reduces the peak of intensity profile and improves CD repeatability. As the result, an immersion microscope with high NA condenser lens is available for CD measurement of 45 nm generation masks.
Databáze: OpenAIRE