Novel High Sensitivity EUV Photoresist for Sub-7 nm Node
| Autor: | Tomoki Nagai, Satoshi Dei, Akihiro Oshima, Gijsbert Rispens, Yasin Ekinci, Marieke Meeuwissen, Hisashi Nakagawa, Seiichi Tagawa, Seiji Nagahara, Yuichi Terashita, Kosuke Yoshihara, Yukie Minekawa, Takehiko Naruoka, Oktay Yildirim, Coen Verspaget, Raymond Maas, Elizabeth Buitrago, Gosuke Shiraishi, Rik Hoefnagels |
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| Rok vydání: | 2016 |
| Předmět: |
010302 applied physics
Materials science Polymers and Plastics business.industry Extreme ultraviolet lithography Organic Chemistry 02 engineering and technology Photoresist 021001 nanoscience & nanotechnology 01 natural sciences 0103 physical sciences Materials Chemistry Optoelectronics Node (circuits) 0210 nano-technology business Sensitivity (electronics) Immersion lithography |
| Zdroj: | Journal of Photopolymer Science and Technology. 29:475-478 |
| ISSN: | 1349-6336 0914-9244 |
| DOI: | 10.2494/photopolymer.29.475 |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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