Synthesis of a novel alkaline-developable photosensitive copolymer based on MMA, MAA, SM, and 2-HEMA-grafted GMA copolymer for an innovative photo-imageable dry-peelable temporary protective plastisol

Autor:	Jian-He Yang, Yu-Der Lee, Sheng Chang, Jung-Hsien Chien
Rok vydání:	2013
Předmět:	Glycidyl methacrylate Materials science Polymers and Plastics Organic Chemistry Methacrylate chemistry.chemical_compound Methacrylic acid chemistry Plastisol Polymer chemistry Materials Chemistry Copolymer Methyl methacrylate Prepolymer Acrylic acid
Zdroj:	Journal of Polymer Research. 20
ISSN:	1572-8935 1022-9760
DOI:	10.1007/s10965-013-0115-7
Popis:	Methyl methacrylate, methacrylic acid, styrene and 2-hydroethyl methacrylate were used to synthesize copolymer with carboxylic acid group through free-radical polymerization to develop a prepolymer(PMMSH). Glycidyl methacrylate was then added to react with carboxylic acid groups of PMMSH to form photosensitive copolymer PMMSHgG. Nuclear magnetic resonance and infrared were used to confirm the structures and functional group of the prepolymer and the copolymer while GPC was employed to determine the molecular weight. The sensitivity and resolution of the copolymers were obtained through characteristic exposure curve and SEM observation, respectively. PMMSHgG was also mixed with dry-peelable plastisol, acrylic acid monomer, and photoinitiator to form a photo-imageable dry-peelable plastisol. A suitable peelable composition without scum after UV exposure and post-baking was identified.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::fd97c1f7c3a9f0066a2e6bf0122ab064 https://doi.org/10.1007/s10965-013-0115-7 Zobrazit plný text záznamu Full text from SpringerLink