Direct monitoring of CH3in a filament‐assisted diamond chemical vapor deposition reactor

Autor:	F. G. Celii, J. E. Butler
Rok vydání:	1992
Předmět:	Arrhenius equation Chemistry Analytical chemistry General Physics and Astronomy Methyl radical Diamond Chemical vapor deposition Photoionization engineering.material Protein filament symbols.namesake chemistry.chemical_compound Ionization symbols engineering Thin film
Zdroj:	Journal of Applied Physics. 71:2877-2883
ISSN:	1089-7550 0021-8979
DOI:	10.1063/1.351019
Popis:	The technique of resonance‐enhanced multiphoton ionization (REMPI) was used to determine relative density distributions of gas‐phase methyl radical (CH3) in a filament‐assisted diamond chemical vapor deposition reactor. The dependences of CH3 concentration on input CH4/H2 ratio, filament temperature, and distance from the filament were determined. We also report similar REMPI data for excited‐state C(1D) atoms, which were produced photolytically from an unknown gas‐phase parent. Arrhenius parameters show that the CH3 is not the parent of the C( 1D) atoms. The CH3 density saturates at high filament temperature. We compare the REMPI measurements with other determinations and models of CH3 concentrations.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::fd689218d59765b30a63fb6f8fd74cbe https://doi.org/10.1063/1.351019 Zobrazit plný text záznamu