Ion Beam And Plasma Jet Generated By A 3 kJ Plasma Focus

Autor:	L. K. Lim, S. K. Ngoi, S. L. Yap, C. S. Wong, A. R. Saadah, Swee-Ping Chia, Kurunathan Ratnavelu, Muhamad Rasat Muhamad
Rok vydání:	2009
Předmět:	Physics Dense plasma focus Argon Ion beam Plasma cleaning Scanning electron microscope Astrophysics::High Energy Astrophysical Phenomena chemistry.chemical_element Ion gun Ion Ion beam deposition chemistry Physics::Plasma Physics Physics::Space Physics Atomic physics
Zdroj:	AIP Conference Proceedings.
DOI:	10.1063/1.3192291
Popis:	The plasma focus device is well known as a copious source of X‐ray, neutrons, ion and electron beams. In this work, the characteristics of energetic ion beam emission in a 3 kJ Mather‐type plasma focus is studied. The plasma focus system is operated at low pressure with argon as the working gas. The objective of the project is to obtain the argon ion beam and the plasma jet. The ion beam and plasma jet are used for material processing. In order to investigate the effect of the ion beam and plasma jet, crystalline silicon substrates are placed above the anode. Samples obtained after irradiation with the plasma focus discharge are analyzed by using the Scanning electron microscopy (SEM) and Energy Dispersive X‐ray spectroscopy (EDX).
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::fd51705a7b735ce0e8634c35a01e9ca1 https://doi.org/10.1063/1.3192291 Zobrazit plný text záznamu