New FEOL Cleaning Technology for Advanced Devices beyond 45 nm Node

Autor:	Yumiko Taniguchi, Yamada Yuji, Hiroshi Tomita, Hidenobu Nagashima, Norio Ishikawa
Rok vydání:	2007
Předmět:	Materials science business.industry Node (networking) Environmental chemistry Electrical engineering Wet cleaning General Materials Science Condensed Matter Physics business Atomic and Molecular Physics and Optics
Zdroj:	Solid State Phenomena. 134:185-188
ISSN:	1662-9779
DOI:	10.4028/www.scientific.net/ssp.134.185
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::fd27cfc2c50e67998aa33b789bc2e428 https://doi.org/10.4028/www.scientific.net/ssp.134.185 Zobrazit plný text záznamu