Run-to-run control schemes for CMP process subject to deterministic drifts

Autor:	Argon Chen, Ruey-Shan Guo, Jin-Jung Chen
Rok vydání:	2002
Předmět:	Predictor–corrector method Chemical process Engineering Control theory business.industry Semiconductor device fabrication Control system Process (computing) Process control Polishing business Optimal control
Zdroj:	2000 Semiconductor Manufacturing Technology Workshop (Cat. No.00EX406).
DOI:	10.1109/smtw.2000.883103
Popis:	During IC fabrication, the chemical-mechanical polishing (CMP) process usually suffers from a drift in the run-to-run removal rate due to the wear of the polishing pad. In this paper, two run-to-run control schemes, the predictor corrector control (PCC) and adjusted exponentially weighted moving average (d-EWMA) schemes, for processes under deterministic drifts are presented. The control performance of both schemes is analytically derived and the determination of the optimal control parameters is provided. Validation results using the field CMP data demonstrate the control effectiveness of both control schemes.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::fcca4ab636136c14478bb748b858bd0b https://doi.org/10.1109/smtw.2000.883103 Zobrazit plný text záznamu