Experimental and theoretical study of the cracking behavior of sol-gel-derived SiO 2 film on InP substrate
Autor: | Y.L. Lam, Jian Liu, Zhisheng Yun, Boon S. Ooi, Y. Zhou, Yuen-Chuen Chan |
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Rok vydání: | 2000 |
Předmět: | |
Zdroj: | Applied Physics A: Materials Science & Processing. 70:341-343 |
ISSN: | 1432-0630 0947-8396 |
DOI: | 10.1007/s003390050057 |
Popis: | In this paper, we study and characterize the cracking behavior of a sol-gel-derived amorphous silica film on a InP substrate. The sol-gel silica films are deposited by spin-coating and rapid thermal processing (RTP). It is observed that the volatility of the III-V semiconductor results in the cracking of the films when the annealing temperature is higher than 450 °C, and that the crack patterns are all parallel or perpendicular to . The experimental results on the crack patterns in the sol-gel silica films are then theoretically analyzed. In addition, the critical thicknesses of the sol-gel films on InP are compared with those deposited on Si. |
Databáze: | OpenAIRE |
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