Autor: |
H. Ma, G.-S. Kim, Daniel Pantuso, L. Aryasomayajula, D. Borst, R. Criss, S. Amin, P. Sinha, K. C. Kolluru, Patrick N. Stover, D. Ingerly, David Jones, K. Cheemalapati, C. S. Cook, K. Enamul, A. M. Pillai, Z. Zell, A. Sairam, A. Kandas, Prabhanshu Shekhar, Gomes Wilfred, Aparna Telang, C.F. Petersburg, M. Phen-givoni, Ajay Balankutty, A. Chandra |
Rok vydání: |
2019 |
Předmět: |
|
Zdroj: |
2019 IEEE International Electron Devices Meeting (IEDM). |
Popis: |
This paper presents the key silicon features of Intel’s 3D stacking technology, Foveros, as it is used to enable logic-on-logic die stacking. A robust face-to-face die connection is enabled with a high yielding, robust microbump connection. Additionally, we describe the low resistance TSVs used for connection to the package along with their electrical properties. |
Databáze: |
OpenAIRE |
Externí odkaz: |
|