Ultra-long glass tips for atomic force microscopy
| Autor: | A Ruf, T R Dietrich, Michael H. Abraham, Manfred Lacher, J Diebel |
|---|---|
| Rok vydání: | 1996 |
| Předmět: |
Cantilever
Materials science Silicon Mechanical Engineering chemistry.chemical_element Nanotechnology Conductive atomic force microscopy Electronic Optical and Magnetic Materials chemistry.chemical_compound Hydrofluoric acid chemistry Silicon nitride Mechanics of Materials Etching (microfabrication) Silicon carbide Electrical and Electronic Engineering Composite material Quartz |
| Zdroj: | Journal of Micromechanics and Microengineering. 6:254-260 |
| ISSN: | 1361-6439 0960-1317 |
| Popis: | A new variety of ultra-long tips for atomic force microscopy has been fabricated using photoetchable glass. Photoetchable glass is structured by UV exposure through a quartz mask followed by a heat treatment and etch process in hydrofluoric acid. The process is based on different etching rates with a ratio of about 1:20 between unexposed and exposed parts of the glass. Tips longer than with a tip radius down to 20 nm are possible. The cantilevers are made from silicon carbide. The mechanical properties of such long tips are compared, in theory and in practice, with conventional cantilevers from silicon and silicon nitride. Their strong sensitivity to friction forces for contrast formation in atomic force microscopy is discussed. |
| Databáze: | OpenAIRE |
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