Photoelectric Properties of n-ZnSe/p-Si or p+ -GaAs Heterojunctions
Autor: | Hiromi Yajima, Ryutaro Tanaka, Atsuo Takagi, Toshikazu Suda, Shoichi Kurita |
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Rok vydání: | 1980 |
Předmět: | |
Zdroj: | Japanese Journal of Applied Physics. 19:169 |
ISSN: | 1347-4065 0021-4922 |
DOI: | 10.7567/jjaps.19s2.169 |
Popis: | Resistivity as low as ∼0.1 Ωcm has been obtained in ZnSe which has been evaporated onto p-Si and p+ -GaAs. Infrared quenching of the photocapacitance technique has been applied on these samples to obtain the deep level information. The spectrum of the photoionization cross section for holes from Ag(Zn) level to the valence band was obtained and the peak value was 4.2×10-16 cm2 in n-ZnSe/p+GaAs. The deep Ag(Zn) level is located at 0.59 eV from the top of the valence band at 300 K. Two levels of 0.6 and 0.9 eV from the top of the valence band are obtained in the undoped n-ZnSe/p-Si at 300 K. The dominant current transport mechanism is tunneling-recombination via interface states. The doping profile of the Ag(Zn) level was also obtained from the modified C-V method. |
Databáze: | OpenAIRE |
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