Large dynamic range silicon photomultiplier with epitaxial quenching resistor

Autor:	代 雷 Dai Lei, 梁 琨 Liang Kun, 张鑫淦 Zhang Xin-gan, 杨 茹 Yang Ru, 刘红敏 Liu Hong-min, 龙金燕 Long Jin-yan, 韩德俊 Han De-jun
Rok vydání:	2020
Předmět:	Quenching Materials science Silicon photomultiplier law business.industry Large dynamic range Optoelectronics Resistor Epitaxy business Atomic and Molecular Physics and Optics Electronic Optical and Magnetic Materials law.invention
Zdroj:	Optics and Precision Engineering. 28:535-541
ISSN:	1004-924X
DOI:	10.3788/ope.20202803.0535
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::fb2c81997dc61aec2956fbdf017fd174 https://doi.org/10.3788/ope.20202803.0535 Zobrazit plný text záznamu