Measurement and simulation of impinging precursor molecule distribution in focused particle beam deposition/etch systems
| Autor: | Ivo Utke, Vinzenz Friedli, Johann Michler, Simone Amorosi, Patrik Hoffmann |
|---|---|
| Rok vydání: | 2006 |
| Předmět: |
Chemistry
Monte Carlo method Analytical chemistry Substrate (electronics) Condensed Matter Physics Molecular physics Focused ion beam Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials Free molecular flow Etching Cathode ray Deposition (phase transition) Electrical and Electronic Engineering Particle beam |
| Zdroj: | Microelectronic Engineering. 83:1499-1502 |
| ISSN: | 0167-9317 |
| DOI: | 10.1016/j.mee.2006.01.136 |
| Popis: | The distribution of metal-precursors supplied via a gas injection system to the substrate inside a focused electron beam (FEB) induced deposition system is investigated for the first time. The impinging precursor molecules are thermally decomposed using a heating stage. Resulting deposit thickness profiles obtained from [(PF"3)"2RhCl]"2, Co"2(CO)"8, and (hfac)CuVTMS precursors are determined optically by interference colors or by profilometry. FEB access to the precursor flux peak and the flux peak value itself depend on tube tilt and vertical tube distance to the substrate. Monte Carlo simulation match best the experiments when assuming molecular flow conditions. |
| Databáze: | OpenAIRE |
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