Effects of ethylene gas flow rate on optoelectrical properties of nitrogenated thin amorphous carbon films grown by microwave surface wave plasma CVD
| Autor: | Hare Ram Aryal, Sudip Adhikari, S.M. Mominuzzamn, Tetsuo Soga, Masayoshi Umeno, Takashi Jimbo, Dilip Chandra Ghimire, Hideo Uchida |
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| Rok vydání: | 2008 |
| Předmět: |
Materials science
Mechanical Engineering Analytical chemistry chemistry.chemical_element General Chemistry Chemical vapor deposition Electronic Optical and Magnetic Materials Indium tin oxide Carbon film X-ray photoelectron spectroscopy Amorphous carbon chemistry Plasma-enhanced chemical vapor deposition Materials Chemistry Electrical and Electronic Engineering Thin film Carbon |
| Zdroj: | Diamond and Related Materials. 17:1724-1727 |
| ISSN: | 0925-9635 |
| DOI: | 10.1016/j.diamond.2007.12.039 |
| Popis: | We report on the effects of ethylene gas (C 2 H 4 ) on the electrical and optical properties of amorphous carbon (a-C) thin films grown on silicon, indium tin oxide (ITO) and quartz substrates by microwave surface wave plasma chemical vapor deposition (MW SWP CVD) at low temperature ( |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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