Cesium retention during sputtering with low energy Cs+ and oxygen flooding
Autor: | Jens Rip, Wilfried Vandervorst, Bart Berghmans |
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Rok vydání: | 2010 |
Předmět: |
Ion beam
Silicon Analytical chemistry chemistry.chemical_element Germanium Surfaces and Interfaces General Chemistry Partial pressure Condensed Matter Physics Oxygen Surfaces Coatings and Films chemistry Sputtering Materials Chemistry Inductively coupled plasma Inductively coupled plasma mass spectrometry |
Zdroj: | Surface and Interface Analysis. 43:225-227 |
ISSN: | 0142-2421 |
DOI: | 10.1002/sia.3676 |
Popis: | Accurate knowledge of the stationary Cs retention during Ultra Low Energy (ULE |
Databáze: | OpenAIRE |
Externí odkaz: |