Catalytic Doping of Phosphorus and Boron Atoms onto Hydrogenated Amorphous Silicon Films

Autor:	Hideki Matsumura, Keisuke Ohdaira, Junichi Seto
Rok vydání:	2015
Předmět:	Amorphous silicon chemistry.chemical_compound Materials science chemistry Phosphorus Doping Inorganic chemistry chemistry.chemical_element Boron Catalysis
Zdroj:	Extended Abstracts of the 2015 International Conference on Solid State Devices and Materials.
DOI:	10.7567/ssdm.2015.c-7-5
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::faa2f1c01de671deabb2f75cabcfddff https://doi.org/10.7567/ssdm.2015.c-7-5 Zobrazit plný text záznamu