Preparation of permalloy films using facing-type targets and a high-rate and low-temperature sputtering method
| Autor: | Y. Hoshi, Shunichi Yamanaka, Masahiko Naoe, Masaya Kojima |
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| Rok vydání: | 1982 |
| Předmět: | |
| Zdroj: | Electronics and Communications in Japan (Part I: Communications). 65:91-98 |
| ISSN: | 1520-6424 8756-6621 |
| DOI: | 10.1002/ecja.4400651012 |
| Popis: | Permalloys are promising as candidates for a thin-film head and as a material for the soft substrate magnetic layer using normal magnetic memory media. Permalloy films prepared using facing-type targets and a high-rate and low-temperature sputtering process are examined. As a result in the facing-type target sputtering method, it is desirable to use double targets with a structure consisting of a small satellite target positioned eccentrically inside the mother target. The morphology and magnetic properties of sputtered films depend strongly on the substrate bias voltage. To obtain a good magnetic film, a substrate bias voltage in the range of -120 to -150 V and/or a substrate temperature of 350 C is needed. In particular, with the application of bias voltage, in addition to being stress free at low substrate temperature, a thermally stable film is also obtained. It is observed that adhesion of the film to the substrate can be improved by sputter-cleaning of the substrate before deposition. Perpendicular anisotropy of the films decreases significantly and the magnetic properties of the films improve with increasing substrate bias voltage and substrate temperature. This is probably attributable to the change in film morphology. |
| Databáze: | OpenAIRE |
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