Ionization of sputtered metal atoms in a microwave ECR plasma source
| Autor: | N. P. Poluektov, I. G. Usatov, V. N. Kharchenko |
|---|---|
| Rok vydání: | 2001 |
| Předmět: |
Materials science
Physics and Astronomy (miscellaneous) Physics::Instrumentation and Detectors Plasma parameters business.industry chemistry.chemical_element Plasma Condensed Matter Physics Xenon chemistry Physics::Plasma Physics Aluminium Ionization Physics::Atomic and Molecular Clusters Microelectronics Physics::Atomic Physics Atomic physics Spectroscopy business Microwave |
| Zdroj: | Plasma Physics Reports. 27:625-633 |
| ISSN: | 1562-6938 1063-780X |
| Popis: | The ionization of sputtered aluminum atoms in the plasma of a microwave ECR discharge intended for metal coating of submicron-size structures in microelectronics is studied. The spatial distributions of xenon plasma parameters and their variations under the action of metal atoms are investigated using probe and optical emission spectroscopy techniques. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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