Reactivity of monolayer V2O5 films on TiO2(110) produced via the oxidation of vapor-deposited vanadium
| Autor: | Mikael Concepcion, John M. Vohs, G.S. Wong |
|---|---|
| Rok vydání: | 2003 |
| Předmět: |
Thermal desorption spectroscopy
Chemistry Inorganic chemistry Vanadium chemistry.chemical_element Surfaces and Interfaces Condensed Matter Physics Photochemistry Vanadium oxide Surfaces Coatings and Films X-ray photoelectron spectroscopy Oxidation state Torr Monolayer Materials Chemistry Reactivity (chemistry) |
| Zdroj: | Surface Science. 526:211-218 |
| ISSN: | 0039-6028 |
| DOI: | 10.1016/s0039-6028(03)00006-2 |
| Popis: | The growth, and reactivity of monolayer V 2 O 5 films supported on TiO 2 (1 1 0) produced via the oxidation of vapor-deposited vanadium were studied using X-ray photoelectron spectroscopy and temperature programmed desorption (TPD). Oxidation of vapor-deposited vanadium in 10 −7 Torr of O 2 at 600 K produced vanadia films that contained primarily V 3+ , while oxidation in 10 −3 Torr at 400 K produced films that contained primarily V 5+ . The reactivity of the supported vanadia layers for the oxidation of methanol to formaldehyde was studied using TPD. The activity for this reaction was found to be a function of the oxidation state of the vanadium cations in the film. |
| Databáze: | OpenAIRE |
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