Properties of all-thin-film glass/ITO/WO3:H/Ta2O5/NiOx/ITO electrochromic devices prepared by magnetron sputtering
| Autor: | Xungang Diao, Zhonghou Wu, Mei Wang, Yuliang Zhou, Junji Guo, Guobo Dong, Xiaoqi Che, Dongmei Dong |
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| Rok vydání: | 2018 |
| Předmět: |
Direct current magnetron sputtering
Materials science business.industry Metals and Alloys 02 engineering and technology Surfaces and Interfaces Sputter deposition 010402 general chemistry 021001 nanoscience & nanotechnology Electrochromic devices 01 natural sciences 0104 chemical sciences Surfaces Coatings and Films Electronic Optical and Magnetic Materials Ion Indium tin oxide X-ray photoelectron spectroscopy Materials Chemistry Transmittance Optoelectronics Thin film 0210 nano-technology business |
| Zdroj: | Thin Solid Films. 662:6-12 |
| ISSN: | 0040-6090 |
| Popis: | Thin films of WO3:H (~450 nm) were prepared on indium tin oxide (ITO) coated glass by reactive direct current magnetron sputtering at room temperature. The visible transmittance of the original state, and the X-ray photoelectron spectroscopy analysis of WO3:H films prove that H+ ions have been introduced into the structure of WO3. Based on the optimized parameters of WO3:H thin film, the Glass/ITO/WO3:H/Ta2O5/NiOx/ITO electrochromic devices (ECDs) are prepared monolithically by magnetron sputtering. Different applied voltages of 1.0, 2.0 and 3.0 V were applied to the ECD for investigating its influence on the ECD's optical contrast and cycle life. Though the ECD can get a higher contrast about 42% at 550 nm under 3.0 V voltage, however, it will be destructed quickly. When the operating voltage is 2.0 V, the ECD has a stable cycle performance with the optical contrast of >30%. |
| Databáze: | OpenAIRE |
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