Molecular arrangement investigation of copper phthalocyanine grown on hydrogen passivated Si(111) surfaces
Autor: | S. Menzli, C. Chefi, A. Akremi, B. Ben Hamada, C. Ben Azzouz, A. Laribi, A. Souissi, I. Arbi |
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Rok vydání: | 2014 |
Předmět: |
Materials science
Silicon Passivation Photoemission spectroscopy Inorganic chemistry General Physics and Astronomy chemistry.chemical_element Surfaces and Interfaces General Chemistry Condensed Matter Physics Surfaces Coatings and Films Crystallography X-ray photoelectron spectroscopy Electron diffraction chemistry Molecule Work function Thin film |
Zdroj: | Applied Surface Science. 305:396-401 |
ISSN: | 0169-4332 |
Popis: | Chemical, electronic and structural properties of ultra thin films of copper phthalocyanine (CuPc) grown on hydrogen passivated silicon (1 1 1) surfaces were investigated in situ by X-ray photoelectron spectroscopy (XPS), ultraviolet photoemission spectroscopy (UPS), X-ray photoelectron diffraction (XPD) and electron diffraction (LEED). The early stages of copper phthalocyanine adsorption (1–2) were characterized by the saturation of surface defects and by a flat lying disposition on the surface. Upon further CuPc coverage, the passivation of Si surfaces resulted in the molecule taking a standing position in films. The molecular packing deduced from these studies appears very close to the one in the bulk α phase of CuPc. The work function of the films was found to be decreasing during the growth and was correlated with the molecular orientation. |
Databáze: | OpenAIRE |
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