Nanoscale structure and chemistry of Al0.49In0.51P thermal oxide
Autor: | B. P. Tinkham, D. T. Mathes, Russell D. Dupuis, R. D. Heller, Robert Hull |
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Rok vydání: | 1999 |
Předmět: | |
Zdroj: | Applied Physics Letters. 75:2572-2574 |
ISSN: | 1077-3118 0003-6951 |
DOI: | 10.1063/1.125081 |
Popis: | In this letter, the nanoscale structure and chemistry of the III–V thermal oxide formed from Al0.49In0.51P is described. Transmission electron microscopy studies have shown that the oxide is an amorphous compound, which occupies greater volume than the original unoxidized crystalline Al0.49In0.51P layer, and which contains O, Al, In, and P (i.e., none of the species are completely desorbed during the oxidation reaction). Electron energy loss spectroscopy and energy spectroscopic imaging have shown specifically that the oxidation products include Al2O3 and In2O3 and P, either as an oxide or in some other amorphous compound. |
Databáze: | OpenAIRE |
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