| Autor: |
Guenther Hraschan, Alain Charles, Sebastian Schmidt, Thomas Metzdorf, Jochen Scheurich, Ralf Otto, Karl Mautz, John Maltabes, Dietmar Ganz, Thorsten Schedel, Ralf Schuster, Steffen Hornig |
| Rok vydání: |
2000 |
| Předmět: |
|
| Zdroj: |
SPIE Proceedings. |
| ISSN: |
0277-786X |
| DOI: |
10.1117/12.389080 |
| Popis: |
SEMICONDUCTOR3000 was the first pilot production facility for 300nm wafers in the world. This company, a joint venture between Infineon Technologies and Motorola, is working to develop a manufacturable 300mm wafer tool set. The lithography tools include I-line stepper, and two DUV scanners. These tools are used to build both 64M DRAM devices and aggressive test vehicles. This paper shows the influence of non-linear errors on 300nm wafers is much stronger than on 200mm wafers. The team determined the root causes for the stronger appearance of these effects and proposed solutions to improve the overlay performance. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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