TiO2 thin films using organic liquid materials prepared by Hot-Wire CVD method
| Autor: | Takashi Itoh, Norimitsu Yoshida, Takao Kunii, Yasuhiko Takamido, Kouichi Mizuno, Tomoki Narita, Shunsuke Ogawa, Tamio Iida, Shuichi Nonomura |
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| Rok vydání: | 2008 |
| Předmět: |
Silicon
Chemistry Metals and Alloys Analytical chemistry chemistry.chemical_element Surfaces and Interfaces Sputter deposition Conductivity Evaporation (deposition) Electron beam physical vapor deposition Surfaces Coatings and Films Electronic Optical and Magnetic Materials Carbon film Physical vapor deposition Materials Chemistry Composite material Thin film |
| Zdroj: | Thin Solid Films. 516:807-809 |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/j.tsf.2007.06.204 |
| Popis: | TiO2 thin films prepared by Hot-Wire CVD method have been studied as a protecting material of transparent conducting oxide (TCO) against atomic hydrogen exposures for the fabrications of Si thin film solar cells. It was found that electrical conductivity of the films at room temperature reached a value of 0.4 S/cm. This value is 2–3 orders of magnitude higher than that of TiO2 films prepared by RF magnetron sputtering and electron-beam evaporation methods in our previous works. The conductivity improvement seems to be partly due to the enlargement of TiO2 crystallites. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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