The efficient DTCO Compact Modeling Solutions to Improve MHC and Reduce TAT
Autor: | Ho-Kyu Kang, Chanho Yoo, Minkyoung Kim, Jungmin Lee, Sung Jin Kim, Kyungjin Jung, Dae Sin Kim, Sung-Duk Hong, Udit Monga, Jaesung Park, Yohan Kim |
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Rok vydání: | 2018 |
Předmět: |
010302 applied physics
Computer science business.industry Process (engineering) Process development 02 engineering and technology Transistor scaling 021001 nanoscience & nanotechnology 01 natural sciences Computer architecture 0103 physical sciences 0210 nano-technology business Dram Design technology Agile software development |
Zdroj: | 2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD). |
Popis: | This paper introduces the recent modeling challenges of the Process Development Kit (PDK) development due to the limitations of transistor scaling and the impact of new process technologies. And a new modeling solution, Agile PDK is presented to break though these development challenges by enabling the Design Technology Co-Optimization (DTCO) activities in the manufacturing levels. A series of advanced algorithms are newly introduced to not only reduce the PDK development time (TAT), but also improve the model accuracies and Model-to-Hardware Correlation (MHC). It is applied to the latest DRAM technology and dramatically reduces the development TAT up to 50% with improved model accuracies. |
Databáze: | OpenAIRE |
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