Pulsed‐jet etch chamber for preparing silicon samples for transmission electron microscopy
| Autor: | G. Hawkins, L. Rivaud |
|---|---|
| Rok vydání: | 1985 |
| Předmět: |
Jet (fluid)
Materials science Silicon business.industry fungi technology industry and agriculture chemistry.chemical_element macromolecular substances Isotropic etching Optics stomatognathic system chemistry Transmission electron microscopy Etching (microfabrication) Optoelectronics Dry etching Reactive-ion etching business Sample chamber Instrumentation |
| Zdroj: | Review of Scientific Instruments. 56:563-566 |
| ISSN: | 1089-7623 0034-6748 |
| DOI: | 10.1063/1.1138288 |
| Popis: | An apparatus is described for wet chemical etching of silicon specimens for transmission electron microscopy. This etch chamber thins the central portion of a 3‐mm disk to a specified thickness (1–50 μm) in a controlled and reproducible manner. The use of a pulsed jet in a sample chamber totally filled with etchant allows the etching process to be observed visually. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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