| Autor: |
J.U. Lee, W.S. Choi, Y.C. Oh, Jin-Sa Kim, M.J. Song, C.N. Cho, Cheol-Gi Shin, B.M. So, C.H. Kim |
| Rok vydání: |
2005 |
| Předmět: |
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| Zdroj: |
Proceedings of 2005 International Symposium on Electrical Insulating Materials, 2005. (ISEIM 2005).. |
| DOI: |
10.1109/iseim.2005.193440 |
| Popis: |
The (Sr/sub 0.9/Ca/sub 0.1/)TiO/sub 3/(SCT) thin films were deposited on Pt-coated electrode (Pt/TiN/SiO/sub 2//Si) using RF magnetron sputtering method. The composition of SCT thin film were closed to stoichiometry (1.081 in A/B ratio). The optimum annealing temperature of SCT thin film was 600[/spl deg/C]. The dielectric constant depending on the annealing temperature was shown to be the great 146 at 600[/spl deg/C]. The temperature coefficients of capacitance exhibit very stable values below /spl plusmn/4[%] in the temperature range of -80 /spl sim/ 90[/spl deg/C]. The temperature properties of the dielectric loss have a stable value within 0.02. The drastic decrease of dielectric constant and increase of dielectric loss in SCT thin films is observed above 200[kHz]. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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