Autor: |
M.R. Frei, S.K. Theiss, L.T. Gomez, C.A. King, A.J. Becker, D. Kossives, Ya-Hong Xie |
Rok vydání: |
1998 |
Předmět: |
|
Zdroj: |
IEEE Journal of Solid-State Circuits. 33:1433-1438 |
ISSN: |
0018-9200 |
DOI: |
10.1109/4.711344 |
Popis: |
Porous Si layers up to 250 /spl mu/m in thickness are used to isolate spiral inductors from low resistivity substrates. Wafer curvature and secondary ion mass spectroscopy (SIMS) analysis are done to address the manufacturability issue of porous Si. Spiral inductors with a single level Al on 2 in, p-type substrates of 0.008 /spl Omega/-cm resistivity are demonstrated with Q |
Databáze: |
OpenAIRE |
Externí odkaz: |
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