Highly sensitive self-developing soft X-ray resists of silicon-containing aldehyde copolymers and sensitive novolac-based composite resists containing aldehyde copolymer
| Autor: | Kazuo Nate, Takashi Inoue, Hitoshi Yokono, Koichi Hatada |
|---|---|
| Rok vydání: | 1988 |
| Předmět: |
chemistry.chemical_classification
Materials science Polymers and Plastics Trimethylsilyl Silicon Composite number chemistry.chemical_element General Chemistry Aldehyde Toluene Surfaces Coatings and Films chemistry.chemical_compound Monomer chemistry Resist Polymer chemistry Materials Chemistry Copolymer |
| Zdroj: | Journal of Applied Polymer Science. 35:913-921 |
| ISSN: | 1097-4628 0021-8995 |
| DOI: | 10.1002/app.1988.070350407 |
| Popis: | Copolymers of aliphatic aldehydes containing a trimethylsilyl group were prepared at −78°C in toluene using diethylaluminum diphenylamide as an initiator. The copolymer depolymerized into monomeric aldehydes on exposure to soft X-rays. When the copolymer was used as a soft X-ray resist, almost complete development was accomplished by exposure alone. No development step was required. The soft X-ray sensitivity of poly(3-trimethylsilylpropanal-co-propanal) was 50 mJ/cm2 at the film thickness of 1.0 μm. A composite resist system consisting of a novolac resin and an aldehyde copolymer containing trimethylsilyl groups has also been developed and used as an alkaline-developable positive electron-beam and soft X-ray resist. |
| Databáze: | OpenAIRE |
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