Electrical profiling of Si(001) p‐n junctions by scanning tunneling microscopy
Autor: | J. M. Halbout, M. B. Johnson, Edward T. Yu |
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Rok vydání: | 1992 |
Předmět: | |
Zdroj: | Applied Physics Letters. 61:201-203 |
ISSN: | 1077-3118 0003-6951 |
DOI: | 10.1063/1.108218 |
Popis: | Potential distributions across Si(001)p‐n junctions have been studied using cross‐sectional scanning tunneling microscopy, spectroscopy, and potentiometry. A clear transition between p‐ and n‐type material can be seen across each junction, and variations in the energy of the conduction‐band edge can be detected with a spatial resolution of better than 100 A. Current‐voltage characteristics have been measured in both unbiased and electrically biased structures, and measurements under both conditions are consistent with calculated potential distributions. |
Databáze: | OpenAIRE |
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