Advanced Process Monitoring through Fault Detection and Classification for Robust Statistical Process Control of Tantalum Nitride Reactive Sputtering
| Autor: | Stephanie Y Chang, Shiban Tiku, Lam Luu |
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| Rok vydání: | 2022 |
| Zdroj: | 2022 International Symposium on Semiconductor Manufacturing (ISSM). |
| Databáze: | OpenAIRE |
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