Etude Des Reactions De Coupure Des Liaisons O-Si(CH3)3 Dans Des Polystyrenes Silicies En Presence De Sels De Triphenylsulfonium Avec Ou Sans Perylene Sous Irradiation UV Et Visible Et En Couche Mince

Autor:	C. Rosilio, François Schué, N. Madit, Louis Giral, Claude Montginoul, J. C. Guibert, R. Sagnes
Rok vydání:	2010
Předmět:	chemistry.chemical_classification Silicon chemistry.chemical_element Infrared spectroscopy Onium compound General Chemistry Polymer chemistry.chemical_compound chemistry Polymer chemistry Organic chemistry Photosensitizer Polystyrene Brønsted–Lowry acid–base theory Perylene
Zdroj:	Bulletin des Sociétés Chimiques Belges. 101:15-28
ISSN:	0037-9646
Popis:	This paper describes a positive resist formulation containing silylated polystyrene polymer, made photosensitive at wavelengths from 220 to 310 nm by means of an onium salt sensitizer ((C6H5)3SMXn) and at wavelengths from 360 to 450 nm by means of an onium salt and a dye photosensitizer (perylene). In the present study, we report the desilylation of acid-sensitive polymers as poly (4-trimethylsiloxystyrene) or poly [p-trimethylsiloxystyrene-co-p-(tert-butoxycarbonyl) oxystyrene]. The formed Bronsted acid which induces the cleavage of silicon - containing side groups is HMXn. The transformation reaction is followed by IR spectroscopy before and after exposure. This resist system is resistant to etching in an oxygen plasma.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::f6a4abf9f95d406965e1c3f88fd00799 https://doi.org/10.1002/bscb.19921010104 Zobrazit plný text záznamu