Angle Resolved XPS Characterization of the Formation of Cl and Br Bonds in Poly-Silicon Etching and Its Cleaning

Autor:	B. Beckx, Wilfried Vandervorst, S. Vanhaelemeersch, Y.B. Kim
Rok vydání:	1998
Předmět:	Residue (chemistry) Bromine Plasma etching Materials science chemistry X-ray photoelectron spectroscopy Inorganic chemistry Chlorine chemistry.chemical_element General Materials Science Condensed Matter Physics Silicon etching Atomic and Molecular Physics and Optics
Zdroj:	Solid State Phenomena. :153-156
ISSN:	1662-9779
DOI:	10.4028/www.scientific.net/ssp.65-66.153
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::f68e221a133feb9cc1a372c4ef6f3970 https://doi.org/10.4028/www.scientific.net/ssp.65-66.153 Zobrazit plný text záznamu